E-mail
真空金屬鍍膜 |超硬鍍膜 |光學鍍膜 |Plasma treatment |Vacuum Components
Hollow cathode
plasma source
Ion beam source
High vacuum
angle valves
現有客戶參考資料
 
表面處理
 
 
 
Vacuum Components

Ion beam source

Applications
  • The ion beam source is particularly well suited for the generation of low energy ions. This source is applied especially for
  • ion supported PVD coating
  • Surface cleaning
  • Surface modification.
A main field of employment is the ion supported deposition of optically active coating systems on mineral glasses and synthetic materials.

Advantages

Coating systems deposited with ion support feature the following improved characteristics:

  • higher refractive index
  • higher packing density
  • better adhesion
  • better stoichiometry
  • excellent long term stability vis-à-vis environmental influences
  • reduced water absorption
Principle

The electrons of the glow cathode, which is primarily used for beam neutralisation, are used for plasma development. The stable discharge is supported by a magnetic field, which is generated through an electromagnetic coil and through the special shape of the gas flow system. The ion source has no lattice. The design of the ion optics supports the development of an optimum geometry of the ion beam.

 

Ion beam source IBS 120

 

Main characteristics: VTD Vakuumtechnik Dresden GmbH - Willkommen
Area of operating pressure mbar 1 x 10-4 ... 5 x 10-4
Ion energy eV 60 ... 100
Ion current A 0.3 ... 0.7
Gas flow sccm 0.1 ... 0.3
Effectiveness diameter mm 500 at distance 450
Neutralisation   Tungsten glow cathode
Measurements Ø x H 205 x 140
Resistance   O2

 
407台灣省台中市工業區3621F    TEL:886-4-2355-2327    FAX:886-2355-2457